The $400 machine will one day no longer be the crown jewel of the tech economy. Moore’s law will march on, processor power ...
China has quietly mandated that at least 50% of equipment used for new semiconductor capacity be domestically sourced.
According to a report from Tom's Hardware, China's so-called "Frankenstein" EUV scanner was assembled from mismatched parts sourced through various channels, potentially including surplus equipment ...
Intel's Fab 52 in Arizona is currently the most advanced chip production facility in America, but it has yet to reach its ...
China’s secret "Manhattan Project" has built an EUV prototype using ex-ASML staff. Learn how Huawei and SMIC are closing the ...
China is now accused of doing what Washington spent years trying to prevent: building its own version of the world’s most ...
Intel recently confirmed the latest results in its partnership with ASML. The US chipmaker worked with engineers from the European corporation to install, test, and validate ...
EUV machines sit at the heart of a technological Cold War. They use beams of extreme ultraviolet light to etch circuits thousands of times thinner than a human hair onto silicon wafers, currently a ...
B, the first High-NA EUV lithography tool designed for commercial production, reiterating Intel's plans to use High-NA EUV patterning for 14A process technology and onwards.
A report from Reuters claims that scientists in China have created a prototype of a machine that could eventually be used to produce semiconductor chips capable of powering artificial intelligence.
Intel's foundry arm says it has crossed a major lithography milestone: it has announced successful acceptance testing of ASML's TWINSCAN EXE:5200B High Numerical Aperture (High-NA) EUV scanner, one of ...